Author Details
Kovalchuk, А. V.
| Issue | Section | Title | File |
| Vol 53, No 5 (2024) | ДИАГНОСТИКА | Electron cyclotron resonance plasma studies using the second cyclotron harmonic resonance |
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Keywords
Förster effect
atomic layer deposition
charge qubit
dissociation
etching
fluorine atoms
fluorocarbon gases
gas temperature
ionization
kinetics
magnetron sputtering
mechanism
memristor
modeling
molecular beam epitaxy
plasma
polymerization
quantum dot
reduced electric field strength
resistive switching
silicon
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Keywords
Förster effect
atomic layer deposition
charge qubit
dissociation
etching
fluorine atoms
fluorocarbon gases
gas temperature
ionization
kinetics
magnetron sputtering
mechanism
memristor
modeling
molecular beam epitaxy
plasma
polymerization
quantum dot
reduced electric field strength
resistive switching
silicon