ДИАГНОСТИКА

期 标题 文件
卷 53, 编号 6 (2024) Gas Phase Composition and Fluorine Atom Kinetics in SF6 Plasma PDF
(Rus)
Myakonkikh A., Kuzmenko V., Efremov A., Rudenko K.
卷 53, 编号 5 (2024) Electron cyclotron resonance plasma studies using the second cyclotron harmonic resonance PDF
(Rus)
Kovalchuk А., Shapoval S.
卷 53, 编号 4 (2024) Study of the Photovoltaic Parameters of Inorganic Solar Cells Based on Cu2O and CuO PDF
(Rus)
Saenko A., Bilyk G., Smirnov V.
卷 53, 编号 3 (2024) A comprehensive study of nonuniformity properties of the LiCoO2 thin-film cathode fabricated by RF sputtering PDF
(Rus)
Kurbatov S., Rudy A., Naumov V., Mironenko A., Savenko O., Smirnova M., Mazaletsky L., Pukhov D.
卷 53, 编号 3 (2024) Influence of Hydrogen Additive on Electrophysical Parameters and Emission Spectra of Tetrafluoromethane Plasma PDF
(Rus)
Murin D., Grazhdyan A., Chesnokov I., Gogulev I.
卷 53, 编号 2 (2024) Structural features and electrical properties of si(al) thermal migration channels for high-voltage photovoltaic converters PDF
(Rus)
Lomov A., Seredin B., Martyushov S., Tatarintsev A., Popov V., Malibashev A.
卷 53, 编号 1 (2024) Analysis of Nonlinear Distortions of Dphemt Structures Based on a GaAs/InGaAs Compound with Double-Sided Delta-Doping PDF
(Rus)
Golikov O., Kodochigov N., Obolensky S., Puzanov A., Tarasova E., Khazanova S.
卷 53, 编号 1 (2024) Structuring of the Surface of Thin Carbon Films During Activation by Microsecond Current Pulses PDF
(Rus)
Nefedov D., Shabunin N., Bratashov D.
卷 52, 编号 6 (2023) PROBE AND SPECTRAL DIAGNOSTICS OF PLASMA GAS ENVIRONMENT: BCl3-Cl2 PDF
(Rus)
Murin D., Chesnokov I., Gogulev I., Grishkov A.
卷 52, 编号 5 (2023) Electrophysical Parameters and Emission Spectra of the Glow Discharge of Difluorodichloromethane PDF
(Rus)
Murin D., Chesnokov I., Gogulev I., Grishkov A.
卷 52, 编号 3 (2023) Surface Morphology and Photoluminescence Spectra of Pseudomorphic {InGaAs/GaAs} Superlattices on GaAs (100), (110), and (111)A Substrates PDF
(Rus)
Klimov E., Pushkarev S., Klochkov A., Mozhaeva M.
卷 52, 编号 2 (2023) SEM Measurements of the Dimensions of Relief Structures in the Technological Process of Manufacturing Microcircuits PDF
(Rus)
Novikov Y., Filippov M.
卷 52, 编号 1 (2023) Controlling Silicon Etching Parameters in RF CHF3 Plasma by Optical Emission Spectroscopy PDF
(Rus)
Murin D., Chesnokov I., Pivovarenok S., Efremov A.
卷 52, 编号 1 (2023) Электрофизические характеристики и эмиссионные спектры плазмы тетрафторметана PDF
(Rus)
Мурин Д., Пивоваренок С., Чесноков И., Гогулев И.
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